Kundu, Sandip. <br/><br/>
Nanoscale CMOS VLSI circuits: design for manufacturability / 
 Nanoscale complementary metal oxide semiconductor very large-scale integration circuits 
Sandip Kundu, Aswin Sreedhar. 
 - New York :  McGraw-Hill,  c2010. 
 - xv, 296 p. :  ill. ;  24 cm. 
<br/><br/>Includes bibliographical references and index. 
<br/><br/>Semiconductor manufacturing -- Process and device variability : analysis and modeling -- Manufacturing-aware physical design closure -- Metrology, manufacturing defects, and defect extraction -- Defect impact modeling and yield improvement techniques -- Physical design and reliability -- Design for manufacturability : tools and methodologies. 
<br/><br/><label>ISBN: </label>9780071635196 (alk. paper) 007163519X (alk. paper) 
<br/><br/><label>LCCN: </label>2010022678 
<br/><br/><label>Nat. Bib. No.: </label>GBB011406  bnb 
<br/><br/><label>Nat. Bib. Agency Control No.: </label>015478365  Uk 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Metal oxide semiconductors, Complementary--Design and construction.<br/>Integrated circuits--Very large scale integration--Design and construction.<br/>Nanoelectronics.
<br/><br/><label>LC Class. No.: </label>TK7871.99.M44  / K84 2010 
<br/><br/><label>Dewey Class. No.: </label>621.395